Electronic Book

Handbook of Chemical Vapor Deposition: Principles, Technology and Applications

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Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

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Detail Information

Series Title

Material Science and Engineering

Call Number

4MSE26

Publisher

Norwich, New York : William Andrew., 2000

Collation

506 pages

Language

English

ISBN/ISSN

978-0815514329

Classification

MSE

Edition

2nd edition

Subject(s)

Coatings technology
Surface Coatings
Chemical Vapor Deposition
CVD

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